• fermi level control of point defects during growth of mg-doped gan

    جزئیات بیشتر مقاله
    • تاریخ ارائه: 1392/07/24
    • تاریخ انتشار در تی پی بین: 1392/07/24
    • تعداد بازدید: 1101
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     in this study, fermi level control of point defects during metalorganic chemical vapor deposition (mocvd) of mg-doped gan has been demonstrated by above-bandgap illumination. resistivity and photoluminescence (pl) measurements are used to investigate the mg dopant activation of samples with mg concentration of 2 × 1019 cm−3 grown with and without exposure to ultraviolet (uv) illumination. samples grown under uv illumination have five orders of magnitude lower resistivity values compared with typical unannealed gan:mg samples. the pl spectra of samples grown with uv exposure are similar to the spectra of those grown without uv exposure that were subsequently annealed, indicating a different incorporation of compensating defects during growth. based on pl and resistivity measurements we show that fermi level control of point defects during growth of iii-nitrides is feasible.

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