مقاله Analysis, modelling and simulation of hydrogen peroxide ultrapurification by multistage reverse osmosis : تی پی بین

خلاصه مقاله

Very high purity chemicals are required for preparation of semiconductor materials and manufacture of printed circuit boards because low presence of metallic impurities is needed to avoid defects on silicon surface. Hydrogen peroxide is one of the most demanded chemical by the semiconductor industry and it must be submitted to ultrapurification processes to achieve the exigent requirements the chemical must fulfill to be accepted for semiconductor uses. In this paper, the potential of multistage reverse osmosis processes to reduce the metallic content of technical grade hydrogen peroxide below the limits fixed by the semiconductor industry is investigated. SEMI Grade 1 quality hydrogen peroxide was obtained by a two-pass reverse osmosis process in an experimental lab scale. A model based on Kedem-Katchalsky transport equations together with system material balances was proposed to describe the behavior of the installation. A full analysis of the influence of the design (recovery rates) and operation (applied pressures) variables over the performance of a simulated industrial scale plant was carried out. The economic viability of the simulated plant was demonstrated.

نویسندگان

R. Abejón [ Departamento de Ingeniería Química y Química Inorgánica, Universidad de Cantabria, Avda. Los Castros s/n, 39005 Santander, Cantabria, Spain ]

A. Garea [ Departamento de Ingeniería Química y Química Inorgánica, Universidad de Cantabria, Avda. Los Castros s/n, 39005 Santander, Cantabria, Spain ]

A. Irabien [ Departamento de Ingeniería Química y Química Inorgánica, Universidad de Cantabria, Avda. Los Castros s/n, 39005 Santander, Cantabria, Spain ]

کلمات کلیدی

Ultrapurification Electronic grade chemicals Hydrogen peroxide Reverse osmosis

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Chemical Engineering Research and Design

Papers showing how research results can be used in chemical engineering design, and accounts of experimental or theoretical research work bringing new perspectives to established principles, highlighting unsolved problems or indicating directions for future research, are particularly welcome. Contributions that deal with new developments in plant or processes and that can be given quantitative expression are encouraged. The journal is especially interested in papers that extend the boundaries of traditional chemical engineering.

حوزه های تحت پوشش : Chemical Engineering