• toward discrete axial p–n junction nanowire light-emitting diodes grown by plasma-assisted molecular beam epitaxy

    جزئیات بیشتر مقاله
    • تاریخ ارائه: 1392/07/24
    • تاریخ انتشار در تی پی بین: 1392/07/24
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     in this paper we investigate axial pn junction gan nanowires grown by plasma-assisted molecular beam epitaxy (mbe), with particular attention to the effect of mg doping on the device characteristics of individual nanowire light-emitting diodes (leds). we observe that a significant fraction of single-nanowire leds produce measurable band-gap electroluminescence when a thin algan electron blocking layer (ebl) is incorporated into the device structure near the junction. similar devices with no ebl typically yield below-detection-limit electroluminescence, despite diode-like ivcharacteristics and optically measured internal quantum efficiencies (iqes) of ∼1%. ivmeasurements of the p-regions in pn junction nanowires, as well as nanowires doped with mg only, indicate low p-type conductivity and asymmetric schottky-like p-contacts. these observations suggest that imbalanced carrier injection from the junction and p-contact can produce significant nonradiative losses.

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