effect of argon atmospheric cold plasma on ito surface behavior and construction of single and multi-layer diodes based on it

transparent conductive oxide (tco) layers due to transparency, high conductivity, hole injection capability and widely used have attracted a lot of attention in. one of these layers is indium tin oxide (ito). ito due to low resistance,transparency in the visible spectrum and its proper work function is in the manufacture of organic light emitting diodes and solar cells. one way for improving the ito surface is plasma treatment. in this paper, changes in surface morphology, by applying argon atmospheric pressure cold plasma, was studied through atomic force microscopic (afm) image analysis and fourier transform infrared spectroscopy (ftir) is analyze. ftir analysis showed functional groups were not added or removed, but chemical bond angle and bonds power on the surface changed and also afm images showed that surface roughness increased. these factors lead to the production of diode which they have a better ohmic contact and injection which are more application.